Chinese Journal of Rice Science

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QTL Mapping of Tolerance to Photooxidation in Rice

JIANG Hua , JIANG Liang , ZHAO Jiang-hong , GUO Long-biao , SUN Huan-ming , XUE Da-wei , ZENG Long-jun , ZENG Da-li , LIANG Guo-hua , QIAN Qian   

  • Received:1900-01-01 Revised:1900-01-01 Online:2008-01-10 Published:2008-01-10
  • Contact: LIANG Guo-hua , QIAN Qian

水稻耐光氧化特性的QTL定位

姜华1,2;#姜亮2,#;赵江红1,2;郭龙彪2;孙焕明1,2;薛大伟3;曾龙军1,2;曾大力2;梁国华1,*;钱前2,*   

  1. 1扬州大学 教育部植物功能基因组学重点实验室, 江苏 扬州 225009; 2中国水稻研究所 水稻生物学国家重点实验室, 浙江 杭州310006; 3浙江大学 农业与生物技术学院 农学系, 浙江 杭州 310029

Abstract: A doubled haploid (DH) population including 127 lines, derived from the cross between an indica rice Zhaiyeqing 8 and a japonica rice Jingxi 17 was used to detect quantitative trait loci (QTLs) of tolerance to photooxidation. One QTL controlling tolerance index (TI) was detected on chromosome 1 and five QTLs controlling sensitivity index (SI) for photooxidation tolerance were mapped on chromosomes 1, 1, 6, 8 and 9, respectively. Meanwhile, eight pairs of epistatic loci affecting TI and SI were also detected (three pairs for TI and five pairs for SI). Besides, 41 rice varieties were indentified for photooxidation tolerance and sensitivity indices.

Key words: rice, photooxidation, doubled haploid population, quantitative trait locus, tolerance index, sensitivity index

摘要: 利用由127个株系组成的来源于籼稻品种窄叶青8号和粳稻品种京系17的加倍单倍体群体,以耐性指数和敏感性指数为指标,采用QTL Mapper 1.6统计软件进行水稻耐光氧化反应特性的QTL定位和上位性分析,共检测到控制耐性指数的1个加性效应QTL,位于第3染色体上;控制敏感性指数的加性效应QTL 5个,分别位于第1、1、6、8和9染色体上。还检测到3对影响耐性指数的加性×加性上位性互作效应QTL和5对敏感性指数的上位性QTL。还对41个水稻材料进行了光氧化实验筛选。

关键词: 水稻, 光氧化, 加倍单倍体群体, 数量性状座位, 耐性指数, 敏感性指数